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Growth of and optical emission from GaMnAs thin films grown by molecular beam epitaxy

机译:分子生长Gamnas薄膜的生长和发光   束外延

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摘要

GaMnAs thin films with different Mn doping concentrations were grown viamolecular beam epitaxy using a substrate temperature of 250 {\deg}C. The thinfilms were investigated using photoluminescence (PL) measurements from 8 to 300K. Transitions involving Mn acceptors were identified and a binding energy of~0.1 eV was found. A Mn doping concentration dependent PL spectrum was found tolend insight into the film quality at a local level. Temperature dependent PLstudies show that the doping related emissions drop faster in energy than otherpeaks with increasing temperature, indicating that they are more sensitive tochanges in the surrounding environment.
机译:使用250 beamC的衬底温度通过分子束外延生长具有不同Mn掺杂浓度的GaMnAs薄膜。使用8到300K的光致发光(PL)测量研究了薄膜。鉴定了涉及Mn受体的跃迁,发现〜0.1 eV的结合能。发现了Mn掺杂浓度依赖性的PL光谱,从而有助于深入了解局部水平的膜质量。温度相关的PL研究表明,随着温度的升高,与掺杂有关的发射在能量上的下降比其他峰值更快,这表明它们对周围环境的变化更敏感。

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